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Capacidad del proceso



 
Pos Description
Unitiy
min./max.
A Min. Track Space - Outer Layer µm 75
B Min. Track Width - Outer Layer µm 75
C Min. Track Space - Inner Layer µm 75
D Min. Track Width - Inner Layer µm 75
E Microvia diameter at capture land µm 100
F Microvia diameter at target land µm 75
G Microvia pad at capture land size µm 250
H Microvia pad at target land size µm 250
I Plated through hole min. pad µm 500
J Plated through hole min. diameter drilled µm 250
K Copper thickness base copper µm <=25
L Dielectric layer thickness µm >40
M Copper plating thickness in every single hole µm >100
N Min. buried hole plating thickness µm >=20
O Drill size buried hole µm 250
P Pad size buried hole, innerlayer µm 500
Q Thickness Dielectric layer inner layer µm >=50
R Thickness copper foil µm <=18
S Microvia min copper thickness µm >=15
T Board thickness mm 0.2 - 4.0
  Aspect ratio blind holes (deep/diameter)   <=1
  Plated through hole aspect ratio (PCB-Thick./Diam.)   <=8
  Aspect ratio buried holes   <=8
       
  Finish    
1 HAL, HAL lead free    
2 OSP    
3 Immersion Ni/Au, Immersion tin, Immersion silver    
4 Flash gold    
5 Plated Ni/Au    
6 Ormecon Nano Finish    
       
  Advanced Capabilities    
1 HDI Technology    
2 Thick copper up to 400µm    
3 Heatsink PCB    
4 Impedance controlled PCB    
5 Flexible and rigid-flex PCB    
6 Connection Pads    
 
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